Aminosilanes for Low Temperature Oxides
Chlorosilanes have traditionally been used to generate SiO2 layers, but this requires temperatures of around 500 degree Celsius or more, which in turn results in residual chloride. As a result, in more recent advanced chip nodes there has been a demand for low temperature applied precursors of SiO2. Aminosilane precursors in combination with an oxidant have been found to allow for low temperature ALD deposition of SiO2.
SiVance’s skill at developing chemical processes allows it to custom manufacture many variants of aminosilanes at any scale. High demand for SiVance aminosilanes comes from ALD applications such as ultrathin gate insulators, diffusion barriers and as a coating used in photoresist multi patterning.
Please contact us to receive a quick feasibility response about your exact needs.