In the semiconductor electronics industry, SiVance products are used as photo resist adhesion promoters and CVD/ALD thin film precursors for litho spacers, low temperature oxides, and ultra low-K dielectrics. Our products are enabling the ever smaller and powerful chips inside the smart phones, computers, and tablets we all use on a daily basis.
Our rigorous quality control systems, statistical process control expertise, analytical capabilities, and complete confidentiality enable us to meet the stringent demands of these exacting applications. We are fully equipped to scale these type materials from the lab to multi-ton production scale.
Thin Film Precursors
Our range of products are used as thin film CVD (chemical vapor deposition) and ALD (atomic layer deposition) technologies for litho spacers, low temperature oxides, and ultra low-K dielectrics.
SiVance leads the way in providing these unique precursors used to produce CDOs for semiconductor industry. Over 60 years of silane chemistry experience and process development expertise is leveraged to economically scale up each precursor from lab to multi-ton production plant. By employing these unique strengths SiVance has forged strong relationships with electronic chemical suppliers around the world to confidentially and consistently produce quality precursors for their low K product lines. Learn more >
SiVance’s skill at developing chemical processes allows it to custom manufacture many variants of aminosilanes at any scale. High demand for SiVance aminosilanes comes from ALD applications such as ultrathin gate insulators, diffusion barriers and as a coating used in photoresist multi patterning. Learn more >
Our high purity electronic grade hexamethyldisilazane (HMDS or HMDZ) used in the electronics industry functions as excellent adhesion promoters for photoresist resins in the production of semiconductors. This product is critical to the bonding of photoresists to silicon dioxide surfaces. Learn more >